| 发明名称 |
LITHOGRAPHIC METHOD AND CARRIER SUBSTRATE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new lithographic carrier substrate. <P>SOLUTION: A layer of PDMS and curing agent is provided on one side of the carrier substrate. The PDMS and curing agent receive and adhere to a lithographic substrate. Such dimensions can be given to the carrier substrate that the combination of the carrier substrate and the lithographic substrate may be handled by a conventional lithographic apparatus. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009147327(A) |
申请公布日期 |
2009.07.02 |
| 申请号 |
JP20080309314 |
申请日期 |
2008.12.04 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DE LAAT WILHELMUS JOHANNES MARIA;GUI CHENG-QUN;GIESEN PETER THEODORUS MARIA;LEONARDUS VAN DIJK PAULUS WILHELMUS;MEINDERS ERWIN RINALDO;PETER MARIA |
| 分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
| 代理机构 |
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