| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for checking design data pattern for photomask, in which easily and efficiently checking design data pattern for photomask. <P>SOLUTION: The method for checking design data pattern for photomask includes processes for extracting a bridge pattern having two parallel lines and a bridge for connecting these lines, from the design data pattern for photomask before OPC (optical proximity correction) processing, and determining whether to satisfy conditions that the length of the bridge of an extracted bridge pattern is a length threshold value or less and the width of the bridge is a width threshold value or less. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
