发明名称 EXPOSURE HEAD, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technique whereby a spot latent image can be formed by a sufficient light amount also in a high resolution. <P>SOLUTION: The exposure head includes a substrate where light emitting element rows 2951R with light emitting elements 2951 arranged in a first direction LGD are formed in a second direction LTD, and an imaging optical system LS which forms light-collected parts by imaging the light from the light emitting elements 2951 of the light emitting element rows 2951R of two or more rows to an exposure surface. Two light emitting elements 2951 which form the light-collected parts adjacent to each other in the first direction are arranged in different light emitting element rows 2951R. One light emitting element row 2951R is disposed to match or substantially match with a meridian plane PL_lgd of the imaging optical system. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009143219(A) 申请公布日期 2009.07.02
申请号 JP20080243004 申请日期 2008.09.22
申请人 SEIKO EPSON CORP 发明人 INOUE NOZOMI;NOMURA YUJIRO
分类号 B41J2/44;B41J2/45;B41J2/455;G02B27/18;G03G15/04;H04N1/036 主分类号 B41J2/44
代理机构 代理人
主权项
地址