发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 Objects are to reduce damage to a semiconductor integrated circuit by external stress and to increase the manufacturing yield of a thinned semiconductor integrated circuit. A single crystal semiconductor layer separated from a single crystal semiconductor substrate is used for a semiconductor element included in the semiconductor integrated circuit. Moreover, a substrate which is formed into a thin shape and provided with the semiconductor integrated circuit is covered with a resin layer. In a separation step, a groove for separating a semiconductor element layer is formed in the supporting substrate, and a resin layer is provided over the supporting substrate in which the groove is formed. After that, the resin layer and the supporting substrate are cut in the groove so as to be divided into a plurality of semiconductor integrated circuits.
申请公布号 US2009166896(A1) 申请公布日期 2009.07.02
申请号 US20080339128 申请日期 2008.12.19
申请人 发明人 YAMAZAKI SHUNPEI;TAKAHASHI HIDEKAZU;YAMADA DAIKI;MONMA YOHEI;ADACHI HIROKI
分类号 H01L23/48;H01L21/00 主分类号 H01L23/48
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