APPARATUS FOR PROCESSING SUBSTRATE

摘要

An apparatus for processing a substrate is provided to effectively load a substrate by including a detecting part and a sensor part. An electrostatic chuck(120) is formed inside a process chamber(100). A substrate is arranged on a top surface of the electrostatic chuck. A cover(130) forms a top surface of the process chamber, and seals the process chamber. A sensor part(140) is formed on the cover, and senses loading/unloading of the substrate arranged on the top surface of the electrostatic chuck. A detecting part(150) is connected to the sensor part, and indicates movement of the substrate in order to stably arrange the substrate. The sensor part includes at least three or more optical sensor devices.