| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing the decline of throughput and excellently forming a device. <P>SOLUTION: The exposure apparatus has a first optical unit for irradiating a first irradiation region with patterned first exposure light and a second optical unit capable of irradiating a substrate with patterned second exposure light simultaneously with the first exposure light, for which a second irradiation region is set at a position different from the first irradiation region. In parallel with the operation of exposing a first shot region where a chip configuring the device can be formed on the substrate by the first exposure light, a second shot region where the chip is not formed on the substrate is exposed by the second exposure light. <P>COPYRIGHT: (C)2009,JPO&INPIT |
