发明名称 METHOD AND APPARATUS FOR MEASURING ERROR QUANTITY OF OCCURRENCE FACTOR OF ROTATIONAL ASYMMETRIC ABERRATION
摘要 PROBLEM TO BE SOLVED: To obtain a method and an apparatus for measuring error quantities to be occurrence factors of rotational asymmetric aberration of a test lens with high accuracy, while separating the error quantities of the occurrence factors of the rotational asymmetric aberration from each other. SOLUTION: Seidel's third and fifth order coma aberrations which satisfy linear relational expressions with respect to the face tangle and face deviation of the test lens 1, are selected, and the value of each coefficient in the linear relational expressions is found by computer simulation. Transmission wave front measurement with respect to the test lens 1 is performed by an interferometer equipped with a null mirror 6, and each occurrence quantity of the third and fifth coma aberrations is found. By solving simultaneous equations acquired by substituting the found value of each coefficient and the value of each occurrence quantity of the third and fifth coma aberrations, into the linear relational expressions, each value of the face tangle and face deviation of the test lens 1 is found. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009145081(A) 申请公布日期 2009.07.02
申请号 JP20070320013 申请日期 2007.12.11
申请人 FUJINON CORP 发明人 UEKI NOBUAKI;OKADA SHINYA
分类号 G01M11/02 主分类号 G01M11/02
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