发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED LAYER, PROTECTING LAYER, INSULATING LAYER AND SEMICONDUCTOR DEVICE AND DISPLAY THEREWITH
摘要 A positive-type photosensitive resin composition that exhibits excellent adhesion to a substrate after a humidification treatment includes (A) an alkali-soluble resin, (B) a photosensitive diazoquinone compound, and (C-1) a silicon compound shown by the following formula (1), wherein R1 and R2 represent alkyl groups having 1 to 10 carbon atoms, R3 represents an organic group, and R4 represents an alkylene group having 1 to 10 carbon atoms, and i represents an integer from 0 to 2.
申请公布号 US2009170026(A1) 申请公布日期 2009.07.02
申请号 US20080343983 申请日期 2008.12.24
申请人 SUMITOMO BAKELITE CO., LTD. 发明人 SUGIYAMA HIROMICHI;BANBA TOSHIO;OKAMYO SHUSAKU
分类号 G03F7/004 主分类号 G03F7/004
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