| 摘要 |
PROBLEM TO BE SOLVED: To provide a MEMS resonator which simplifies processes to reduce the cost and also simplifies a system to prevent noise, and a method of manufacturing the MEMS resonator. SOLUTION: The present invention relates to a method for manufacturing a MEMS resonator 2 having a semiconductor device formed on a substrate 10 and a MEMS structure portion 4. The semiconductor device includes an ONO capacitor portion 6 having an upper electrode 30 and a lower electrode 26 and a COMS circuit portion 8, and the lower electrode 26 of the ONO capacitor portion 6 is formed using a first silicon layer 26. A lower structure 16 of the MEMS structure portion 4 and the upper electrode 30 of the ONO capacitor portion 6 are formed using a second silicon layer 52. An upper structure 18 of the MEMS structure portion 4 and a gate electrode 34 of a CMOS circuit portion 8 are formed using a third silicon layer 54. COPYRIGHT: (C)2009,JPO&INPIT
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