| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for batch formation of different members, capable of reducing film roughening and peeling even in the case of batch formation of different members different in thickness with a gradation mask. <P>SOLUTION: The negative resist composition for batch formation of different members includes (a) a binder resin of which the weight average molecular weight is within a range of 4,000-80,000, (b) a polyfunctional monomer of which the molecular weight is ≤700 and which has an ethylenically unsaturated double bond, and (c) a low molecular cyclic ether compound of which the molecular weight is ≤700 and which contains an epoxy group or an oxetane group, wherein the components (a) and (b) occupy ≥60 mass% of the total amount of the components (a), (b) and (c). <P>COPYRIGHT: (C)2009,JPO&INPIT |
