发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTO SPACER AND METHOD OF FORMING THE SAME, PROTECTIVE LAYER, COLORED PATTERN, SUBSTRATE FOR A DISPLAY, AND DISPLAY DEVICE
摘要 <p>A photoresist resin composition, and a method for forming a photo-spacer by using the composition are provided to improve the storage stability in liquid state and to enhance aging stability. A photoresist resin composition comprises a resin having a branched and/or alicyclic structure, an acidic group and a substituted alkyl group at the side chain (wherein the substituted alkyl group has two ethylenically unsaturated bonds); a polymerizable compound having an ethylenically unsaturated bond; and a photopolymerization initiator. Preferably the substituted alkyl group is represented by the formula 1.</p>
申请公布号 KR20090072995(A) 申请公布日期 2009.07.02
申请号 KR20080132576 申请日期 2008.12.23
申请人 FUJIFILM CORPORATION 发明人 FUKUSHIGE YUUICHI;MIYAKE KAZUHITO
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
代理机构 代理人
主权项
地址