发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTO SPACER AND METHOD OF FORMING THE SAME, PROTECTIVE LAYER, COLORED PATTERN, SUBSTRATE FOR A DISPLAY, AND DISPLAY DEVICE |
摘要 |
<p>A photoresist resin composition, and a method for forming a photo-spacer by using the composition are provided to improve the storage stability in liquid state and to enhance aging stability. A photoresist resin composition comprises a resin having a branched and/or alicyclic structure, an acidic group and a substituted alkyl group at the side chain (wherein the substituted alkyl group has two ethylenically unsaturated bonds); a polymerizable compound having an ethylenically unsaturated bond; and a photopolymerization initiator. Preferably the substituted alkyl group is represented by the formula 1.</p> |
申请公布号 |
KR20090072995(A) |
申请公布日期 |
2009.07.02 |
申请号 |
KR20080132576 |
申请日期 |
2008.12.23 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUKUSHIGE YUUICHI;MIYAKE KAZUHITO |
分类号 |
G03F7/027;G03F7/028 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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