PLASMA PROCESSING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of improving wavelength accuracy and accurately monitoring plasma emission. SOLUTION: The plasma processing apparatus includes: an optical fiber 6 for introducing the plasma emission generated inside the plasma processing apparatus; a diffraction grating 9 for dividing the plasma emission introduced through the optical fiber into a plurality of spectrums; photodetectors 10 in a row for detecting the emission intensities of the spectrums divided with the diffraction grating for each spectrum; and a signal processor 12 for computing a plasma emission wavelength on the basis of a prescribed operational expression on the basis of the detection outputs of the photodetectors in a row. The signal processor compares the theoretical spectrum wavelength of a processing gas to be used in plasma processing or a material to be processed with a spectrum wavelength obtained when processing the material to be processed using the processing gas and corrects the operational expression on the basis of the compared result. COPYRIGHT: (C)2009,JPO&INPIT