发明名称 PHOTORADICAL- AND PHOTOCATION-CURABLE COMPOSITION
摘要 The present invention has its object to provide a photoradical- and photocation-curable composition improved in curability. The present invention relates to a photoradical- and photocation-curable composition which comprises: (A) a vinyl polymer having, per molecule, two or more groups represented by the general formula (1): <?in-line-formulae description="In-line Formulae" end="lead"?>-OC(O)C(Ra)-CH2 (1)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein Ra represents a hydrogen atom or an organic group containing 1 to 20 carbon atoms, at least one of which groups occurs at a molecular terminus, and (B) an epoxy compound and/or oxetane compound and that the N atom-containing compound concentration in the component (A) is not higher than 1,000 ppm and the N atom-containing compound concentration relative to the component (B) is not higher than 2,300 ppm.
申请公布号 US2009170975(A1) 申请公布日期 2009.07.02
申请号 US20060067888 申请日期 2006.09.22
申请人 KANEKA CORPORATION 发明人 OGAWA KOHEI;NAKAGAWA YOSHIKI
分类号 C08L33/04 主分类号 C08L33/04
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