发明名称 INDUCTIVELY COUPLED PLASMA REACTOR WITH MULTI LASER SCANNING LINE
摘要 An inductively coupled plasma reactor with a multi laser scanning line is provided to generate the plasma with high density uniformly by controlling the current balance uniformly. An antenna assembly(30) includes a plurality of antenna protection tubes and radio frequency antennas. A plurality of antenna protection tubes are installed to pass through the inside of the reactor body. The plurality of antenna protection tubes include a plurality of dielectric tubes. The plurality of dielectric tubes are arranged in parallel while linearly passing through the inside of the reactor body. The radio frequency antenna is installed inside the plurality of antenna protection tubes. A main power supply source(40) supplies the radio frequency power source to the radio frequency antenna. A laser supply source(80) comprises the multi laser scanning line comprised of the plurality of laser scan lines inside the reactor body.
申请公布号 KR20090072852(A) 申请公布日期 2009.07.02
申请号 KR20070141088 申请日期 2007.12.29
申请人 NEW POWER PLASMA CO., LTD. 发明人 WI, SOON IM
分类号 H05H1/24;H05H1/34 主分类号 H05H1/24
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