发明名称 Method of Creating an Alignment Mark on a Substrate and Substrate
摘要 In an embodiment, a method of creating an alignment mark on a substrate includes forming a plurality of lines segmented into electrically conducting line segments and space segments, thereby forming spaces between the lines to form a macroscopic structure in a first layer of the substrate, creating a plurality of electrically conducting trenches in a second layer of the substrate, and arranging the plurality of trenches to be in electrical contact with the line segments and overlapping the space segments at least partially.
申请公布号 US2009166899(A1) 申请公布日期 2009.07.02
申请号 US20080345113 申请日期 2008.12.29
申请人 ASML NETHERLANDS B.V. 发明人 VAN HAREN RICHARD JOHANNES FRANCISCUS
分类号 H01L23/544;H01L21/44;H01L21/76 主分类号 H01L23/544
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