| 摘要 |
An apparatus for exhausting a chamber gas is provided to prevent permeation of a residual gas inside a chamber in a different process block by completely removing the residual gas after a chamber cover is raised up according to a process completion. A wafer is loaded on a plate(110). A first round vent(120) exhausts a residual gas inside a chamber. A second round vent(130) exhausts the residual gas. An exhausting unit(160) exhausts the residual gas in a cover-up state of the chamber. A detecting part controls an operation of the exhausting unit according to presence of the residual gas. A vent is included in an outer ring of the first round vent and the second round vent, and has a plurality of holes.
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