发明名称 METHOD FOR PRODUCING LITHIUM TANTALATE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a lithium tantalate substrate, by which a lithium tantalate substrate in which rhodium (Rh) is doped in high concentration can be easily produced at a low cost. SOLUTION: The method for producing the lithium tantalate substrate comprises: attaching a positive electrode plate 2 composed of an Rh plate or a Pt-Rh alloy plate to the entire surface on one side of a lithium tantalate single crystal processed into the state of a substrate 1 so that the plate 2 is brought into contact with the entire surface of the single crystal, then attaching a negative electrode plate 3 to the entire surface on the other side of the single crystal; and heat treating the single crystal for 1 to 20 h under a temperature condition of 700°C or higher and lower than the melting point of the lithium tantalate single crystal while applying an electric voltage between the electrode plates. Any of atmosphere, a vacuum atmosphere, an inert gas and a reducing gas can be arbitrarily used as the atmosphere in the heat treatment. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009143746(A) 申请公布日期 2009.07.02
申请号 JP20070320442 申请日期 2007.12.12
申请人 SUMITOMO METAL MINING CO LTD 发明人 KAJIGAYA TOMIO
分类号 C30B29/30;C30B33/02;H03H3/08 主分类号 C30B29/30
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