METHOD FOR ANALYZING COMPOSITION AND STRUCTURE OF NANO THIN LAYER USING ANGLE RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY

摘要

A composition and structure analyzing method of a nano thin film is provided to analysis the composition and structure in every step during a deposition process on a real time basis. A composition and structure analyzing method of a nano thin film comprises: a step of inputting one of the arbitrary composition ratio of the nano thin film or the thickness of a thin film layer(S102); a step of calculating the theoretical optoelectronic intensity according to the thickness of the inputted arbitrary composition ratio and the thin film layer(S104); a step saving the optoelectronic intensity ratio according to the theoretical optoelectronic intensity(S106); a step of measuring the optoelectronic intensity of the specific nano thin film(S108); a step of calculating actual optoelectronic intensity ratio according to the measured optoelectronic intensity(S110); and a step of obtaining one from the composition ratio of the specific nano thin film and the thickness of the thin film layer(S112).