发明名称 IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY
摘要 An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.
申请公布号 US2009166914(A1) 申请公布日期 2009.07.02
申请号 US20080343550 申请日期 2008.12.24
申请人 HITACHI INDUSTRIAL EQUIPMENT SYSTEMS, CO., LTD. 发明人 OGINO MASAHIKO;HASEGAWA MITSURU;MIYAUCHI AKIHIRO
分类号 B29C59/04 主分类号 B29C59/04
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