发明名称 |
IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY |
摘要 |
An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.
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申请公布号 |
US2009166914(A1) |
申请公布日期 |
2009.07.02 |
申请号 |
US20080343550 |
申请日期 |
2008.12.24 |
申请人 |
HITACHI INDUSTRIAL EQUIPMENT SYSTEMS, CO., LTD. |
发明人 |
OGINO MASAHIKO;HASEGAWA MITSURU;MIYAUCHI AKIHIRO |
分类号 |
B29C59/04 |
主分类号 |
B29C59/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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