| 发明名称 |
COMPOSITION FOR FORMATION OF ANTI-REFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION |
| 摘要 |
Disclosed is a composition for forming a top anti-reflective film having a low refractive index, a smooth swing curve, and a small swing ratio. The composition comprises: a compound containing an anthracene skeleton and having a hydrophilic group; and a solvent. The composition enables to form an anti-reflective film on a resist film, and can be used in the photolithography for forming a patter with a light having a wavelength of 160 to 260 nm. |
| 申请公布号 |
WO2009081773(A1) |
申请公布日期 |
2009.07.02 |
| 申请号 |
WO2008JP72681 |
申请日期 |
2008.12.12 |
| 申请人 |
AZ ELECTRONIC MATERIALS (JAPAN) K.K.;AZ ELECTRONIC MATERIALS USA CORP.;NOYA, GO;AKIYAMA, YASUSHI;TAKANO, YUSUKE |
发明人 |
NOYA, GO;AKIYAMA, YASUSHI;TAKANO, YUSUKE |
| 分类号 |
G03F7/11;C08F216/06;C08F220/10;C08F226/10;H01L21/027 |
主分类号 |
G03F7/11 |
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