发明名称 METHOD FOR FABRICATING CAPACITOR WITH PILLAR STORAGENODE
摘要 A method for manufacturing a capacitor with a pillar type storage node is provided to secure a leakage current characteristic by forming the pillar type storage node to secure a space between cells through a part of recesses of a sacrificial layer. A sacrificial layer is formed on a substrate(21). An open region is formed by etching the sacrificial layer. A cylinder electrode and an insulating film pattern(29B) partially reclaiming the inner side of a cylinder electrode is formed in the open region. The sacrificial layer is partially recessed. A pillar type storage node(100) is formed by forming a capping electrode(31A) reclaiming the inlet of the cylinder electrode. The sacrificial layer is removed. The dielectric and the plate are successively formed on the storage node.
申请公布号 KR20090070910(A) 申请公布日期 2009.07.01
申请号 KR20070139074 申请日期 2007.12.27
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHO, HO JIN;PARK, CHEOL HWAN;KIM, JAE SOO
分类号 H01L27/108 主分类号 H01L27/108
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