发明名称 |
METHOD FOR FABRICATING CAPACITOR WITH PILLAR STORAGENODE |
摘要 |
A method for manufacturing a capacitor with a pillar type storage node is provided to secure a leakage current characteristic by forming the pillar type storage node to secure a space between cells through a part of recesses of a sacrificial layer. A sacrificial layer is formed on a substrate(21). An open region is formed by etching the sacrificial layer. A cylinder electrode and an insulating film pattern(29B) partially reclaiming the inner side of a cylinder electrode is formed in the open region. The sacrificial layer is partially recessed. A pillar type storage node(100) is formed by forming a capping electrode(31A) reclaiming the inlet of the cylinder electrode. The sacrificial layer is removed. The dielectric and the plate are successively formed on the storage node.
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申请公布号 |
KR20090070910(A) |
申请公布日期 |
2009.07.01 |
申请号 |
KR20070139074 |
申请日期 |
2007.12.27 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
CHO, HO JIN;PARK, CHEOL HWAN;KIM, JAE SOO |
分类号 |
H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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