| 摘要 |
A method of manufacturing the image sensor is provided to prevent damage including a particle and a crack etc by using a micro lens made of an inorganic material. The first oxide film(109) and the second oxide film(111) are successively formed on the substrate(100). The second oxide film is patterned to expose the first oxide film of the pixel array region. The first photo resist pattern is formed on the first oxide film. The upper part of the first oxide film is isotropically etched by using the first photo resist pattern as a mask. By using the first photo resist pattern as a mask, the first oxide film is anisotropically etched to form the first oxide film pattern. The first oxide film pattern is reflowed and etched to form the micro lens(109c).
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