| 摘要 |
<p>A buffer unit and a method for treating a substrate are provided to improve the efficiency of processing a substrate by providing a new substrate at the other side of a buffer stage. A buffer unit comprises a buffer stage and a driving part for driving the buffer stage, and the buffer stage(160) includes a plurality of buffer region while being installed to be rotatable. One of buffers is arranged at a standby position for a substrate to be process by rotation of the buffer stage, and the other is arranged at a position to which a processed substrate is transferred. The buffer unit includes a plurality of rotation stages which is installed to be rotated on the buffer stage.</p> |
