| 摘要 |
An etching apparatus for glass substrates is provided to closely adhere to a glass substrate in order for an etching fluid to be uniformly dispersed, thereby effectively performing an etching process. An etching apparatus(10) for glass substrates comprises: a fluid flux controller(12); a container(4); and a processing unit with a housing consisting of an etching area, a buffer area and a cleaning area. In the etching area, the etching apparatus is installed and the container is moved along a rail. In the buffer area, an air curtain is installed in order to collect the etching fluid from the glass substrate. The cleaning area has a shower and the air curtain.
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