摘要 |
A method for manufacturing an image sensor is provided to prevent the lowering of the reliability of a microlens formation process due to a polymer residue remaining on a pad region by performing a TV(Terminal Via) formation process to open the pad region of a metal layer after forming the microlens. A nitride barrier(110a) for passivation and a TEOS(Tetra Ethyl Ortho Silicate) film(120a) are successively deposited on a metal layer(100). A color filter(130) is formed in a pixel region. A planarization film(150) having a step on a semiconductor substrate is formed by including a color filter. A microlens(160) is formed on a planarization film of the pixel region. A photoresist pattern for forming a terminal via is formed on the planarization film including the microlens. The terminal via is formed by performing the etching using the photoresist pattern as a mask.
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