| 摘要 |
A support for inspecting a defect of a wafer is provided to improve use efficiency of equipment by performing repetitive reproduction. A support for inspecting a defect of a wafer includes a holder(11) where an edge of a wafer is arranged in an upper part of the inner side. The support for inspecting the defect of the wafer includes a groove(12) fixed in an inspecting device in the edge of the outer side. The support for inspecting the defect of the wafer is made of Ni of 30 to 38 wt%, Co of 3 to 5 wt%, Si of 0.3 to 1 wt%, Mn of 0.2 to 0.4 wt%, C of 0.01 to 0.07 wt%, and Fe of the remaining amount.
|
