发明名称 VACUUM PROCESSING APPARATUS
摘要 A vacuum processing device is provided to increase the number of apparatuses which are installed in one part by suppressing the waste of the space needed for the maintenance. The front of the vacuum processing device(100) is a standby block(101). The behind of the vacuum processing device is a vacuum block(102). Processing units(103,104), return unit(105) and a plurality of lock chambers are equipped in the vacuum block. The standby block comprises a box block(108) and a wafer cassette container(109). The standby block comprises a position aligning portion(111) on the box block. The return unit comprises a transfer chamber(112). The bed of the rectangular shape is arranged in the lower part of the vacuum block.
申请公布号 KR20090071304(A) 申请公布日期 2009.07.01
申请号 KR20080018591 申请日期 2008.02.28
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TAUCHI SUSUMU;KIMURA SHINGO;YATOMI MINORU;ISOZAKI MASAKAZU;MAKINO AKITAKA
分类号 H01L21/67;H01L21/02 主分类号 H01L21/67
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