| 摘要 |
A fluid supplying unit, a fluid supplying method, and a substrate processing device having the same are provided to control an injecting amount of an injection nozzle by controlling a flow rate of an injection nozzle by controlling the size of a control hole. A fluid supplying unit includes a fluid distributing member, an injection nozzle(220), and a flux controller(251). The fluid distributing member provides a fluid path. The injection nozzle is combined in the fluid distribution member. The injection nozzle receives the fluid from the fluid distribution member and injects the fluid. The flux controller is positioned between the injection nozzle and the fluid distribution member. The flux controller controls the flow rate of the fluid inputted to the injection nozzle.
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