| 摘要 |
<p>A method for monitoring a lamp power of an exposing apparatus for a semiconductor device are provided to set an exposure time and measure the intensity of illumination of a lamp accurately by checking a shutter speed in a photolithography in real time. A light source(11) supplies a light of a certain wavelength, and a shutter pass/ blocks a light according to the illumination intensity of light supplied from the light source. A computer(19) receives shutter speed in real time and converts it into illumination intensity, and it displays the illumination intensity on a monitor. The computer is programmed to change a lamp when the illumination intensity is below a predetermined value. An open/close speed of the shutter is adjusted according to the illumination intensity measured by a spot sensor(18).</p> |
