发明名称 |
MULTI INDUCTIVELY COUPLED PLASMA REACTOR WITH MULTI LASER SCANNING LINE |
摘要 |
A multi inductively coupled plasma reactor with a multi laser scanning line is provided to generate the plasma with high density uniformly by controlling current balance uniformly. A multi inductive antenna assembly(30) includes a plurality of antenna bundles for inducing the capacitively coupled plasma inside the reactor body. A multi laser scanning line is comprised of the plurality of laser scanning lines inside the reactor body. The multiple discharge chamber body has the multiple discharge chamber where the plurality of antenna bundles are installed. The plurality of gas inlets for injecting the reactive gas to the multiple discharge chamber are equipped in the multiple discharge chamber body. The multi laser scanning line includes a gas injection slit formed in the multiple discharge chamber body in order to be opened to the inside of the reactor body in the multiple discharge chamber. A main power supply source(40) supplies the wireless frequency power source to the plurality of antenna bundles. A laser supply source(80) comprises the multi laser scanning line. |
申请公布号 |
KR20090069796(A) |
申请公布日期 |
2009.07.01 |
申请号 |
KR20070137587 |
申请日期 |
2007.12.26 |
申请人 |
NEW POWER PLASMA CO., LTD. |
发明人 |
WI, SOON IM |
分类号 |
H05H1/24;H05H1/46 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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