发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF
摘要 An image sensor and a manufacturing method thereof are provided to improve the image performance by delivering the electrons generated from the vertical type photodiode through the anodic bonding region. A circuit including a transistor(120) is formed in a substrate(100). An anodic bonding region(140) is formed at one side of transistor. The first conductivity type region(147) of high concentration is formed on the anodic bonding region. A photodiode(220) is formed on the circuit. The photodiode comprises an intrinsic layer(223) electrically connected to the circuit, and the second conductive type conductive layer(225) formed on the intrinsic layer. The circuit comprises a wiring(150).
申请公布号 KR20090071220(A) 申请公布日期 2009.07.01
申请号 KR20070139452 申请日期 2007.12.27
申请人 DONGBU HITEK CO., LTD. 发明人 PARK, JI YONG
分类号 H01L27/146;H01L31/10;H04N5/335;H04N5/369;H04N5/374 主分类号 H01L27/146
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