| 摘要 |
A photomask cleaning device is provided to prevent growing particle on a surface of a photomask to be cleaned since a sublimate dose not remain on the photomask after removing an adhesives. A cleaning chamber performs a cleaning process of a loaded/unloaded photomask, and a loading/unloading device performs loading/unloading of the photomask in the cleaning chamber. A gripper part(200) clamps the loaded photomask, and a cleaning process part(300) sprays sublimate on the clamped photomask and removes an adhesives attached on the photomask after removing a pellicle. The cleaning process part includes a first spray unit spraying an adhesive firstly and it also includes a second spray unit removing remaining adhesive.
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