| 摘要 |
An apparatus and a method for preventing contamination of a self plasma chamber are provided to block the deposition of a contamination material in an inner wall and a window of the self plasma chamber by using a blocking wall. An apparatus for preventing contamination of a self plasma chamber include an electromagnetic filed part, and one or more blocking walls(130a,130b). The electromagnetic filed pat generates the electric field and makes the contamination material get out of a linear path. The linear path faces the window of a self plasma chamber(40) from a process chamber. The blocking wall prevents the contamination material from reaching the window. An optical signal from the self plasma chamber passes through a penetration hole(140) through the linear path and reaches the window.
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