发明名称 Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles
摘要 The present invention provides a method for coating a group 4 semiconductor surface composed mainly of a group 4 semiconductor elements and a process for producing group 4 semiconductor particles having a luminescent capability and semiconductor particles and a semiconductor element produced thereby. The method for coating a semiconductor surface according to the present invention comprises the steps of: providing a semiconductor material comprising a group 4 element selected from the group consisting of silicon, germanium, carbon, and tin; reacting the surface of the semiconductor material with an inert organic solvent-soluble and electron-donating reducing agent in the inert organic solvent to coat the surface of the semiconductor material with a metal derived from said reducing agent; and then reacting the surface of the semiconductor material with a compound with an electron withdrawing group, said compound comprising an element selected from the group consisting of group 4 elements and transition metal elements, to coat the surface of the semiconductor material with the group 4 element or the transition metal element derived from said compound with the electron withdrawing group. The utilization of this method can produce semiconductor particles or a semiconductor element such as a light emitting element and an optical modulator.
申请公布号 US7553775(B2) 申请公布日期 2009.06.30
申请号 US20050182865 申请日期 2005.07.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMAMOTO KAZUSHIGE
分类号 H01L21/31;H01L21/302;H01L21/469 主分类号 H01L21/31
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