| 摘要 |
A method of fabricating a liquid crystal display device is provided. An aluminum alloy layer and a copper metal layer are sequentially formed on a substrate. A photoresist pattern is formed on the copper metal layer and the copper metal layer and the underlying aluminum alloy layer are etched to form a gate line. A gate insulating layer, an amorphous silicon layer and an impurity-doped amorphous silicon layer are deposited and then etched to form a semiconductor layer. An aluminum alloy layer and a copper metal layer are sequentially formed and etched on the structure to form a data line, a source electrode and a drain electrode. A passivation layer is formed and a contact hole and a pad opening are formed in the passivation layer. A transparent conductive thin film is deposited on this structure. |
