CAPACITOR IN SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

A capacitor of a semiconductor device and a manufacturing method thereof are provided to secure the capacity of a capacitor and to form a supporting membrane between storage electrodes in order to prevent the leaning of the storage electrodes. A method for manufacturing a capacitor of a semiconductor device comprises the following steps of: forming a mold dielectric on a substrate(10); selectively etching the mold dielectric to form a storage electrode region; forming a material film on the whole surface of mold dielectric including the storage electrode region and completely reclaiming the material film up to predetermined height of the storage electrode region; separating the material film to form a storage electrode(20a); and removing the mold dielectric.