发明名称 APPARATUS FOR SUPPLYING SOURCE GAS
摘要 An apparatus for supplying source gas is provided to prevent waste of a source material with high price by accurately notifying that the source material is reduced to specific level. An apparatus for supplying source gas is a device providing a source material(120) stored in a source material container(100) into deposition chamber in which a thin film is deposited by the chemical gasity deposition method. The apparatus for supplying source gas comprises a notification device(150). The notification device informs when the standard amount of source material remains in the source material container.
申请公布号 KR20090069088(A) 申请公布日期 2009.06.29
申请号 KR20070136934 申请日期 2007.12.24
申请人 TERASEMICON CORPORATION 发明人 JANG, TAEK YONG;LEE, BYOUNG IL;WEE, KWANG HEE
分类号 H01L21/205 主分类号 H01L21/205
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