发明名称 A PHOTO RESIST CONTAINER
摘要 <p>A semiconductor photoresist solution reservoir is provided prevent economical loss and environmental contamination by reducing remained and disused semiconductor photoresist solution. A semiconductor photoresist solution reservoir includes a housing and a nozzle. An lower portion of the housing has a shape of funnel along an inner circumference. Thus, the photoresist solution is gathered in lowest end portion formed in the center of the reservoir due to the gravity. The bottom of the funnel is located at lateral bottom portion of the reservoir. The nozzle is inserted into the housing and the photoresist solution can be ejected through the nozzle. The nozzle is inserted from the upper portion of the reservoir.</p>
申请公布号 KR20090068543(A) 申请公布日期 2009.06.29
申请号 KR20070136211 申请日期 2007.12.24
申请人 DONGBU HITEK CO., LTD. 发明人 KIM, JONG DOO
分类号 H01L21/027;H01L21/02 主分类号 H01L21/027
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