发明名称 LIGHT EMITTING DEVICE AND ELECTRONIC DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent unevenness of the film thickness of a light emitting layer due to conduction holes of an insulating layer. <P>SOLUTION: A current source transistor TS is formed on the surface of a substrate 10. A second insulating layer 46 and a planarization layer 48 cover the current source transistor TS. A light emitting element E is an organic EL element in which a light emitting layer 56 is interposed between a first electrode 52 and a second electrode 58. The first electrode 52 is formed on the surface of the planarization layer 48 and is connected to a drain electrode of the current source transistor TS via the conduction hole Hb1 which is formed in a side in the planarization layer 48 and the second insulating layer 46, wherein the side is opposite to the light emitting element E side across the current source transistor TS. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009137274(A) 申请公布日期 2009.06.25
申请号 JP20080147799 申请日期 2008.06.05
申请人 SEIKO EPSON CORP 发明人 MIYAO TOSHIAKI;JO HIROAKI
分类号 B41J2/44;B41J2/45;B41J2/455;H01L51/50 主分类号 B41J2/44
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