发明名称 |
LIGHT EMITTING DEVICE AND ELECTRONIC DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent unevenness of the film thickness of a light emitting layer due to conduction holes of an insulating layer. <P>SOLUTION: A current source transistor TS is formed on the surface of a substrate 10. A second insulating layer 46 and a planarization layer 48 cover the current source transistor TS. A light emitting element E is an organic EL element in which a light emitting layer 56 is interposed between a first electrode 52 and a second electrode 58. The first electrode 52 is formed on the surface of the planarization layer 48 and is connected to a drain electrode of the current source transistor TS via the conduction hole Hb1 which is formed in a side in the planarization layer 48 and the second insulating layer 46, wherein the side is opposite to the light emitting element E side across the current source transistor TS. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009137274(A) |
申请公布日期 |
2009.06.25 |
申请号 |
JP20080147799 |
申请日期 |
2008.06.05 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MIYAO TOSHIAKI;JO HIROAKI |
分类号 |
B41J2/44;B41J2/45;B41J2/455;H01L51/50 |
主分类号 |
B41J2/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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