发明名称 |
SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM |
摘要 |
A pattern forming system 1 includes a checking apparatus 400, a storage device 502, and a control section 500. The checking apparatus 400 is configured to measure and check a state of a resist pattern formed on a substrate W after a developing process and output a first check result thus obtained, and to measure and check a state of a pattern formed on the substrate after an etching process and output a second check result thus obtained. The storage device 502 stores a correlation formula obtained from the first check result and the second check result. The control section 500 is configured to use the correlation formula to obtain a target value of the state of the pattern after the developing process from a target value of the state of the pattern after the etching process, and to use a difference between the target value of the state of the pattern after the developing process and the first check result to set a condition for the first heat process and/or the second heat process.
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申请公布号 |
US2009162759(A1) |
申请公布日期 |
2009.06.25 |
申请号 |
US20060065782 |
申请日期 |
2006.09.13 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
OGATA KUNIE;TOMITA HIROSHI;TANAKA MICHIO;UEMURA RYOICHI |
分类号 |
G03C5/00;H01L21/027;H01L21/66 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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