发明名称 |
PHOTOMASK HAVING CODE PATTERN FORMED BY CODING DATA CONVERSION PROCESS INFORMATION, PHOTOMASK FORMATION METHOD, AND SEMICONDUCTOR DEVICE FABRICATION METHOD |
摘要 |
Design data of a wafer pattern to be formed on a semiconductor wafer is converted into mask data corresponding to a mask pattern to be formed on a photomask for use in the formation of the wafer pattern, and the mask pattern is formed on the photomask on the basis of the mask data. A code pattern obtained by coding information of the data conversion process of converting the design data into the mask data is formed on the photomask.
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申请公布号 |
US2009162758(A1) |
申请公布日期 |
2009.06.25 |
申请号 |
US20080338550 |
申请日期 |
2008.12.18 |
申请人 |
IKENAGA OSAMU |
发明人 |
IKENAGA OSAMU |
分类号 |
G03F1/36;G03F1/68;G03F1/70;G03F7/20;G06F17/50;H01L21/027 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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