| 摘要 |
A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid, a holder for holding the substrates in the treating tank, a chamber enclosing the treating tank, a solvent vapor supply device for supplying the solvent vapor into the chamber, an exhaust device for exhausting gas from the chamber through an exhaust pipe connected at one end thereof to the chamber, a drain pipe connected at one end thereof to the chamber for draining the treating liquid from the chamber, a gas-liquid separator having the other end of the exhaust pipe connected thereto for receiving the gas exhausted by the exhaust device, and having the other end of the drain pipe connected thereto for receiving the treating liquid drained through the drain pipe, the gas-liquid separator separating the gas and the liquid, and a mixer mounted on the exhaust pipe for mixing deionized water into the gas exhausted by the exhaust device.
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