| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new nonionic photosensitive compound useful as an acid generator for a resist composition, an acid generator, a resist composition, and a method for forming resist pattern. <P>SOLUTION: The nonionic photosensitive compound has a cyclic group containing an ester linkage in the cyclic skeleton in the structure. The acid generator comprises the above nonionic photosensitive compound. The resist composition comprises (A) a base component exhibiting the solubility into an alkaline developing solution which changes by the action of an acid and (B) an acid generator component which generates an acid by the irradiation with a radial ray, wherein the component B includes, in its structure, an acid generator (B1) comprising a nonionic photosensitive compound having a cyclic group containing an ester bond in the ring skeleton. <P>COPYRIGHT: (C)2009,JPO&INPIT |
