发明名称 COATING FOR FORMING ANTISTATIC RELEASE LAYER AND ANTISTATIC RELEASE FILM
摘要 PROBLEM TO BE SOLVED: To provide a coating for forming an antistatic release layer and an antistatic release film. SOLUTION: The coating for forming the antistatic release layer includes an electroconductive polymer dispersed in an organic solvent, a silicon compound in which one or more of isocyanate groups are directly bonded to a silicon atom, a polyorganosiloxane having a terminally connected hydroxyl group, an acrylic resin having a hydroxyl number of 20 mg KOH/g or lower and/or an acid number of 20 mg KOH/g or lower and an amino resin, wherein the polyorganosiloxane and the acrylic resin are present in a solid part mass ratio of from 10:90 to 60:40. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009138101(A) 申请公布日期 2009.06.25
申请号 JP20070315935 申请日期 2007.12.06
申请人 ACHILLES CORP 发明人 SEKIYA MIHO;MOCHIZUKI ATSUSHI
分类号 C09D201/00;B32B27/00;B32B27/18;C09D5/00;C09D133/00;C09D161/20;C09D183/04;C09K3/16 主分类号 C09D201/00
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