发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
摘要 A substrate processing apparatus, a substrate processing method, and a storage medium are provided to reduce a frequency of forced stop operations caused by reduction of a processing solution within a processing solution supply unit. A plurality of solution processing units perform solution processing operations on a substrate. A substrate transferring unit transfers the substrate with respect to the solution processing units. A processing solution supply unit(13) supplies the processing solution to the solution processing units. A residual processing solution detection unit detects the residual amount of processing solution within the processing solution supply unit. A control unit stops a substrate transferring operation of the substrate transferring unit when the residual amount of processing solution is lower than the predetermined amount of processing solution.
申请公布号 KR20090068122(A) 申请公布日期 2009.06.25
申请号 KR20080125077 申请日期 2008.12.10
申请人 TOKYO ELECTRON LIMITED 发明人 SATAKE KEIGO
分类号 H01L21/02;H01L21/304;H01L21/3065 主分类号 H01L21/02
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