发明名称 |
Method of testing optical materials by irradiating with high energy density radiation, optical materials selected by said method and uses thereof |
摘要 |
An optical material for lithographic applications is selected from crystal materials by a testing method. The crystal materials are preferably quartz and/or alkali or alkaline earth halides, especially fluorides, or mixed crystals. The testing method includes three tests to measure irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at 193 nm and the non-intrinsic fluorescence intensity at 740 nm is measured; 2) the optical material is irradiated with high energy density laser light and a change in respective absorptions before and after irradiation at 385 nm is measured; and 3) the optical material is irradiated with an X-ray or radioactive source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
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申请公布号 |
US2009159816(A1) |
申请公布日期 |
2009.06.25 |
申请号 |
US20090398402 |
申请日期 |
2009.03.05 |
申请人 |
VON DER GOENNA GORDON;POEHL KARIN;MARTIN REGINA;PARTHIER LUTZ |
发明人 |
VON DER GOENNA GORDON;POEHL KARIN;MARTIN REGINA;PARTHIER LUTZ |
分类号 |
G01N21/64 |
主分类号 |
G01N21/64 |
代理机构 |
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地址 |
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