Method of processing semiconductor substrate and processing apparatus

摘要

A method of processing semiconductor substrates includes the steps of: storing attribution data indicating an attribution of each of the semiconductor substrates in a recording medium according to piece identification codes of the semiconductor substrates; generating a start direction accompanying one of the piece identification codes of the semiconductor substrates with a control unit; retrieving the attribution data corresponding to one of the semiconductor substrate related to the start direction from the recording medium with a processing condition setting unit; selecting one of processing conditions according to the attribution data thus retrieved and a processing condition determining table in which a plurality of the processing conditions is set according to the attributions of the semiconductor substrates with the processing condition setting unit; and processing one of the semiconductor substrates related to the start direction under the one of the processing conditions thus selected with a processing unit.