| 摘要 |
<p>Thiopyran derivatives that are useful in the increase of refractive index of resist substratum resin without detriment to the transparency and acid reactivity required for resist; polymers having the thiopyran derivatives as constituents thereof; resist compositions containing the polymers; and a process for producing semiconductor devices with the use of the resist compositions. The thiopyran derivatives have the structures of the general formula:[Chemical formula 14] (1) wherein X is either O or S; R1 is any of -H, -CH3, C2-C4 alkyl, thioether and ketone; and R2 is any of -H, -CH3 and trifluoromethyl, provided that R1 and R2 may be identical with or different from each other.</p> |
