| 摘要 |
An exposure apparatus for exposing a substrate to radiant energy in a vacuum is disclosed. The apparatus comprises a chamber in which the vacuum is generated, a blowing device including a supply nozzle (17a) located in the chamber and configured to blow, through said supply nozzle, a gas to an object (2) arranged in the chamber in which the vacuum is generated, and a recovery device including a recovery nozzle (17b) located in the chamber and configured to recover, through the recovery nozzle, the gas blown into the chamber through said supply nozzle, wherein the apparatus is configured so that the object moves in a direction opposite to a direction from the supply nozzle to the recover nozzle, parallel to blowing by the blowing device.
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