发明名称 Non-Volatile Memory Devices
摘要 Non-volatile memory devices are provided including a control gate electrode on a substrate; a charge storage insulation layer between the control gate electrode and the substrate; a tunnel insulation layer between the charge storage insulation layer and the substrate; a blocking insulation layer between the charge storage insulation layer and the control gate electrode; and a material layer between the tunnel insulation layer and the blocking insulation layer, the material layer having an energy level constituting a bottom of a potential well.
申请公布号 US2009159962(A1) 申请公布日期 2009.06.25
申请号 US20080338308 申请日期 2008.12.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HYUN SUK;SHIM SUN-II;KANG CHANG-SEOK;JEONG WON-CHEOL;CHOI JUNG-DAL;PARK JAE-KWAN;LIM SEUNG-HYUN;KIM SUN-JUNG
分类号 H01L29/792 主分类号 H01L29/792
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